Beam Imaging Solutions (BIS)?presents the new model RFIS-100 ion source assembly. The RFIS-100 is designed to be retrofittable to the standard?model G-1 and G-2 ion gun?accelerator systems. The ion source operates with a RF power supply at 13.56 MHz with manual adjust match network to produce an inductively coupled plasma (ICP). The RF ion source offers many benefits over the standard Colutron hot cathode DC discharge source including much longer operating time between maintenance, especially with oxygen and reactive gasses, and also higher beam currents. In addition to being able to produce ions from gasses, the new ion source has the added capability of producing metal ions by sputtering the source gas with a metal target in the discharge chamber. Customers that do not already own a Colutron ion gun can purchase the new source to fit to their own ion accelerator systems. Customers that have the Colutron ion gun would remove the standard Colutron DC ion source and heat sink assembly from the ion gun and attach the RF ion source directly to the Colutron model 500 insulator flange. The RF source does not require the Colutron heat sink to operate.

RFIS-100 Specifications

• 6” (152mm) Conflat

• 25.5 Pounds (11.6 kg) (Includes match box)

Power Supply Requirements (Available Separately from the RFIS-100 package)

• 13.56MHz, 500W

• 200V, 0.5A

• 6.5 Turn, 2mm diameter Cu tube, water cooled, 1/8″ VCR

• 10kV Isolation, 1/8” Swagelok input

• 5kV Isolation, Copper, 1/8″ VCR

• 12kV Isolation feedthrough

• 1 Liter/min (RF Antenna)

• Fan built into Plexiglas Enclosure for High Voltage Safety protection. (Fan Specification:47 CFM, 12VDC, 200mA)

• Two Vacuum variable capacitors (Tune, Load)
• 10-1200 pF, 4kV (Nominal), 6kV (Max), 75A (Manual Tune), Pmax=15kW (@40MHz)

• 2 X 1/4” Swagelok, Water cooling, RF Antenna
• 1/8” Swagelok, Source Gas Inlet
• RF Type N, Male
• BNC, Male, Sputter Target Supply