光斑分析儀

美國DATARAY BMS2-CM4-Si-5光斑分析儀,光束輪廓分析儀

美國DATARAY BMS2-CM4-Si-5光斑分析儀,光束輪廓分析儀

美國DATARAY 生產兩種類型的掃描狹縫光束分析儀:BeamMap 系列,提供實時 M2、發散、聚焦和對準管理,以及 Beam’R 系列, 緊湊且精確的光束分析,所有的狹縫掃描光束分析儀均配備 Si、Ge 和 InGaAs 探測器,覆蓋波長從 190 nm 到 2500 nm。

美國DATARAY Multiple Z-plane XYZΘΦ Scanning Slit System, 190 to 2500* nm

Port-powered USB 2.0

S-BMS2-CM4-Si-5

Features

  • 190 to 1150 nm, Silicon detector
  • 650 to 1800 nm, InGaAs detector
  • 1000 to 2300 or 2500 nm, InGaAs (extended) detector
  • Beam diameters ~100 μm to ~3 mm (1.5 mm with extended InGaAs)
  • 25 μm slit pairs with Si; 0.1 to 2 μm sampling intervals
  • 50 μm slit pairs with InGaAs; 0.1 to 2 μm sampling intervals
  • Real-time?±1 mr real-time Divergence and Pointing measurement accuracy
  • Port-powered USB 2.0; flexible 3 m cable; no power brick
  • 0.1 μm sampling and resolution
  • Linear & log X-Y profiles, centroid
  • Profile zoom & slit width compensation
  • Real-time?multiple Z plane scanning slit system
  • Real-time?XYZ profiles, Focus position
  • Real-time?M2, Divergence, Collimation, Alignment

Applications

  • Laser printing & marking
  • Medical lasers
  • Diode laser systems
  • Fiber optic telcom assembly focusing – LensPlate2™ option for re-imaging waveguides and fiber ends
  • Development, production, field service
  • CW;?Pulsed lasers, Φ μm ≥ [500/(PRR in kHz)]
  • M2 measurement with available M2DU stage

* model-dependent

BeamMap graphic


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