Kimball Lanthanum Hexaboride Cathode with Guard Ring 帶防護(hù)環(huán)的六硼化鑭陰極

Kimball Lanthanum Hexaboride Cathode with Guard Ring 帶防護(hù)環(huán)的六硼化鑭陰極

Description

The Kimball Physics ES-423GR Guard Ring Lanthanum Hexaboride (LaB6) Cathode is a high performance, resistively heated, thermionic electron source. It is currently employed in many brightness-limited electron optical systems: SEM’s, TEM’s, probes, electron lithography systems, and more.

Kimball Physics ES-423GR防護(hù)環(huán)六硼化鑭（LaB6）陰極是一種高性能、電阻加熱的熱離子電子源。目前，它被用于許多亮度受限的電子光學(xué)系統(tǒng)：SEM、TEM、探針、電子光刻系統(tǒng)等。

The design of the crystal geometry is similar to the conical shape with a microflat tip found in the LaB6 ES-423E design. However, this?advanced design optimizes emission from the microflat region and suppresses emission from the inclined conical surface by utilizing the additional guard ring structure?without requiring elevated electric fields from the Wehnelt/grid.

晶體幾何形狀的設(shè)計(jì)類(lèi)似于LaB6 ES-423E設(shè)計(jì)中的具有微平面尖端的錐形。然而，這種先進(jìn)的設(shè)計(jì)優(yōu)化了來(lái)自微平面區(qū)域的發(fā)射，并通過(guò)利用額外的保護(hù)環(huán)結(jié)構(gòu)抑制了來(lái)自?xún)A斜錐形表面的發(fā)射，而不需要來(lái)自Wehnelt/柵極的升高的電場(chǎng)

The exposed emitter surface can range from 10 μm to 250 μm diameter, with a standard diameter of 25 μm. The single crystal LaB6?<100> orientation, is mounted on the end of a single-piece, stress-free carbon heater rod, and is held in place by a carbon ferrule. The additional guard ring aperture structure controls the exposure of the LaB6?surface.

暴露的發(fā)射極表面直徑范圍從10μm到250μm，標(biāo)準(zhǔn)直徑為25μm。單晶LaB6<100>取向，安裝在單片無(wú)應(yīng)力碳加熱棒的末端，并由碳套圈固定到位。附加的保護(hù)環(huán)孔徑結(jié)構(gòu)控制LaB6表面的曝光。

The model ES-423GR is available in custom configurations with the LaB6?crystal cut at a cone angle of 60o or 90o and with a microflat size range from 10 μm to 250 μm. The LaB6?cathode is available mounted on a standard AEI base, a Kimball Physics CB-104 ceramic base or on a variety of custom bases for particular systems.

ES-423GR型號(hào)有定制配置，LaB6晶體以60o或90o的錐角切割，微平面尺寸范圍從10μm到250μm。LaB6陰極可安裝在標(biāo)準(zhǔn)AEI底座、Kimball Physics CB-104陶瓷底座或用于特定系統(tǒng)的各種定制底座上。

Applications:

  • Scanning Electron Microscopes
  • Transmission Electron Microscopes
  • Electron Lithography Systems
  • Electron Accelerators
  • X-ray Sources
  • Custom Applications應(yīng)用程序：

    掃描電子顯微鏡

    透射電子顯微鏡

    電子光刻系統(tǒng)

    電子加速器

    X射線源

    自定義應(yīng)用程序

Features / Options:

  • Guard Ring Design?with optimized emission from the microflat surface
  • Extended Lifetime
    • Thousands of functional hours in
      clean vacuum
    • Guaranteed Against Structural
      Mounting Failure
  • Exceptional Stability
    • Precision machined carbon mounting
    • High over-temperature tolerance
  • High Brightness / Low Energy Spread
    • <100> Oriented Single Crystal
    • Best Quality / High Purity Material
    • Emission current densities up to 30 A/cm2
    • Operating pressure < 10-7?torr
  • Accurate Microflats
    • Superior Optics
    • Controlled Source Size
    • Standard Diameters Available
    • Range of emission surface sizes
    • Custom sizes available
  • On AEI base, compact CB-104 base or request custom mounting

功能/選項(xiàng)：

微平面發(fā)射優(yōu)化的防護(hù)環(huán)設(shè)計(jì)

延長(zhǎng)使用壽命

數(shù)千個(gè)工作小時(shí)

清潔真空

保證不受結(jié)構(gòu)影響

安裝故障

卓越的穩(wěn)定性

精密加工碳支座

高溫耐受性

高亮度/低能量擴(kuò)散

<100>定向單晶

最佳質(zhì)量/高純度材料

發(fā)射電流密度高達(dá)30 A/cm2

工作壓力<10-7托

精確的微平臺(tái)

卓越的光學(xué)性能

受控源大小

提供標(biāo)準(zhǔn)直徑

發(fā)射表面尺寸范圍

提供自定義尺寸

在AEI底座上，緊湊型CB-104底座或要求定制安裝

 


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