LK2000 HREELS instrument LK technologies

The LK2000 HREELS instrument has seen widespread use in industrial and academic laboratories worldwide. It has been successfully applied to a diverse range of problems, including hydrocarbon chemisorption (catalysis) on metals, analysis of silicon wafer cleaning techniques, surface plasmons, characterization of polymer films, C₆₀?film studies, and innumerable others.

• Resolution at 3 meV (FWHM) and below
• Rotatable and Fixed Optics Models
• Integral Dual Magnetic Shielding for Simple “Bolt-On” Installation

LK2000 HREELS 儀器已在全球工業(yè)和學(xué)術(shù)實(shí)驗(yàn)室得到廣泛應(yīng)用。它已成功應(yīng)用于各種問題，包括金屬的碳?xì)浠衔锘瘜W(xué)（催化）、硅晶片清潔技術(shù)分析、表面質(zhì)粒、聚合物薄膜的表征、C60薄膜研究，以及無數(shù)別人。

分辨率在 3 meV （FWHM） 及以下
可旋轉(zhuǎn)和固定光學(xué)型號(hào)
集成雙磁性屏蔽，用于簡單的”螺栓打開”安裝