LK2000 HREELS instrument LK technologies
The LK2000 HREELS instrument has seen widespread use in industrial and academic laboratories worldwide. It has been successfully applied to a diverse range of problems, including hydrocarbon chemisorption (catalysis) on metals, analysis of silicon wafer cleaning techniques, surface plasmons, characterization of polymer films, C60?film studies, and innumerable others.
- Resolution at 3 meV (FWHM) and below
- Rotatable and Fixed Optics Models
- Integral Dual Magnetic Shielding for Simple “Bolt-On” Installation
LK2000 HREELS 儀器已在全球工業和學術實驗室得到廣泛應用。它已成功應用于各種問題，包括金屬的碳氫化合物化學（催化）、硅晶片清潔技術分析、表面質粒、聚合物薄膜的表征、C60薄膜研究，以及無數別的應用。
分辨率在 3 meV （FWHM） 及以下
可旋轉和固定光學型號
集成雙磁性屏蔽，用于簡單的”螺栓打開”安裝
