極低束流能量的高束流離子源Ion Guns Model 1402提供額外的深度分析和樣品清潔功能

NonsequiturModel 1402離子槍具有極低束流能量的高束流,也可以在最高3keV的能量下操作,以提供額外的深度分析和樣品清潔功能。可能的應(yīng)用包括電荷補(bǔ)償、電散射和電子/固體相互作用的研究。

Ion generation is by means of electron impact ionization with dual filaments for long source life without having to break system .vacuum The filaments are located off axis to prevent line of sight deposition of the filament material onto the sample.

Design Features

  • Unique ion source for stable emission
  • Dual Tungsten alloy filaments
  • Power supply and deflection supply in a single 5-1/4 19″ rack mount
  • UHV Construction
  • Electrical connections and gas inlet all rear of housing for simplified installation.

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