Nonsequitur離子槍離子源Model 1450 Design Features
- Adjustable spot size ≥ 5um for spatially defined sputtering or implantation
- Emission regulated bombardment provides stable ion current
- Continuously variable beam energy 5kV to 50kV
- Dual octupole for beam scanning and astigmatism correction
- Pre-objective scanning for reduced spot size
- No direct filament to sample line of sight to avoid sample contamination
- Customer replaceable filaments and beam trimming apertures
- Dual filaments provide operational backup in case of filament end of life
- All UHV compatible and etch resistant materials used in fabrication
- Differential pumping to minimize main chamber gas load
- Operates over the range of inert gases and Nitrogen
Nonsequitur離子槍離子源Model 1450選配
- Thoria coated Iridium filaments for operation with Oxygen
- Variable aperture for spot size down to 1um
- Blanking plates for fast beam pulsing
- Alkali metal source for operation with Cs, Li, Na, K etc
- Source oven to permit production of ions of evaporable materials
- Source with integral Wien filter
