Nonsequitur 離子槍離子源Model 1420 Design Features

• Adjustable spot size ≥ 5um for spatially defined sputtering or implantation
• Emission regulated bombardment provides stable ion current
• Continuously variable beam energy 5kV to 20kV
• Dual octupole for beam scanning and astigmatism correction
• Pre-objective scanning for reduced spot size
• No direct filament to sample line of sight to avoid sample contamination
• Customer replaceable filaments and beam trimming apertures
• Dual filaments provide operational backup in case of filament end of life
• All UHV compatible and etch resistant materials used in fabrication
• Differential pumping to minimize main chamber gas load
• Operates over the range of inert gases and Nitrogen
• 可調點大小≥ 5um，用于空間定義的濺射或植入
  排放調節轟炸提供穩定的離子電流
  連續可變光束能量 5kV 至 20kV
  用于光束掃描和散光校正的雙八角形
  目標前掃描，以減少點大小
  沒有直接燈絲到樣品視線，以避免樣品污染
  客戶可更換燈絲和光束修剪孔徑
  雙絲在燈絲壽命結束時提供操作備份
  制造中使用的所有超高壓兼容和蝕刻耐藥材料
  差分泵送，以盡量減少主室氣體負荷
  在惰性氣體和氮氣范圍內工作

Nonsequitur 離子槍離子源Model 1420 選配

• Thoria coated Iridium filaments for operation with Oxygen
• Variable aperture for spot size down to 1um
• Blanking plates for fast beam pulsing
• Alkali metal source for operation with Cs, Li, Na, K etc
• Source oven to permit production of ions of evaporable materials
• Source with integral Wien filter
• 托里亞涂層虹膜絲與氧氣操作
  可變光圈的斑點大小下降到1um
  用于快速光束脈動的空白板
  堿金屬源與 Cs、Li、Na、K 等一起運行
  源烤箱，允許生產離子的可蒸發材料
  具有積分維恩過濾器的源