Nonsequitur公司的Model 1401離子源離子槍非常適合用于表面化學(xué)實(shí)驗(yàn)，例如使用Auger 和ESCA進(jìn)行樣品制備和深度分析，可以用于惰性氣體。

在工作距離為25mm，束流大小為20μA時(shí)，光斑為直徑0.4mm。相比較于其他的離子槍而言，離子槍Model 1401能提供的電流密度是其他離子槍的1-倍。當(dāng)束流為1μA時(shí)，光斑最小可以選擇到50μm. 電子束能量可以在范圍5eV到5keV中選擇，并同時(shí)保持樣品的最佳聚焦。束流大小可以調(diào)節(jié)，并不受電子束能量的影響，無(wú)需外部設(shè)備，可以直接從前面板進(jìn)行調(diào)節(jié)。

通過(guò)電子沖擊來(lái)生成離子，雙燈絲設(shè)計(jì)可以延長(zhǎng)使用壽命，而無(wú)需中斷設(shè)備的使用。離子源的真空燈絲處于離軸狀態(tài)，以防止燈絲材料沉積到樣品上。
The ion source may be differentially pumped either directly into the system or by means of a separate turbo pump for improved system vacuum.

The controller with power supplies and scan electronics is housed in a single 5-1/4″ high 19″ rack mount cabinet. The Ion Gun can be controlled either from the front panel or through a flexible interface allowing control of beam and focus voltages, ionization current, gas, beam on/off, and raster. The raster scan is digitally generated for uniform etch rate.

Design Features:

• High current density 15 to 50 mA/cm2 depending on spot size selected.
• Unique ion source design for stable emission.
• Dual tungsten filaments with typical filament life-time > 500 hours. Yttria coated iridium optional.
• Replaceable beam trimming aperture with typical life-time > 500 hours.
• All UHV compatible and etch resistant materials used in fabrication.
• Differential pumping tominimize main chamber gas loading.
• Gun is easily disassembled for maintenance.
• Electrical connections and gas inlet located on a single flange for easier installation.
• Preset extraction and condenser lens parameters (three spot size settings) for repeatable operation.
• Integral beam current measurement.
• Direct measurement of ion source pressure.
• System and cable interlocks prevent energizing high voltage with poor vacuum or cable removed.
• Power supply and raster generator in single 5-1/4 high 19 inch rack mount enclosure.
• Digitally generated raster option for uniform etch profile.
• Computer control option.
• Optional ion source pressure regulation.