Nonsequitur 離子源離子槍 Model 1403 TOF/SIMS設計特點
- High brightness electron impact source for maximum bulk material removal
- Emission regulated bombardment provides stable ion current with front panel adjustable dynamic range x300
- Adjustable spot size from 20 μm to > 1 mm for spatially defined sputtering
- Continuously variable beam energy up to 5keV
- Neutral species suppression using beam bending optics
- Beam blanking capability for TOF SIMS
- Integral beam current monitoring capability
- Replaceable beam trimming aperture with typical life-time of > 500 hours
- Dual filaments provide operational backup with typical filament life-time > 500 hours
- Internal source pressure sensor permits monitoring of ion source pressure
- All UHV compatible and etch resistant materials used in fabrication
- Pre-objective lens deflection for reduced spot size
- Differential pumping to minimize main chamber gas loading
- Operates over the range of inert gas species
