磁控源，用于在濺射過程中施加具有高均勻性的薄層。適用于直徑為3英寸的目標。
根據濺射工藝所需的條件，我們提供兩種類型的源：B型和C型。
所有類型都與我們的M600DC-PS電源以及市場上所有其他直流、射頻和脈沖直流電源完全兼容。
特性
有或沒有原位傾斜模塊
安裝法蘭范圍
煙囪為標準配置
氣動圓頂式或側擺式百葉窗
間接冷卻
選項
質量流量控制器（MKS MF1）
定制長度
Z機械手
B型磁控源用于在濺射過程中施加具有高均勻性的薄層。該電源與特高壓條件兼容。磁控源專為濺射磁性和鐵磁性材料而設計。它可以對厚度達7毫米的目標進行操作。
| Mounting flange | DN 160 CF* |
| Max. power (DC mode) | 600 W DC ** |
| Max. power (RF mode) | 600 W RF ** |
| Max. voltage DC | 1200 V |
| Connector DC/RF | type 7/16 |
| Target | |
| ?? form | ring |
| ?? diameter | 3″ (76.2 mm) ± 0.2 mm |
| ?? thickness | 1 – 7 mm (magnetic & non-magnetic) |
| ?? cooling | indirect |
| Water flow | min. 1 l/min |
| Max. inlet water temperature | < 28 °C |
| Max. water pressure | 3 bar |
| Tubing diameter | ?6×1 mm PTFE |
| Magnet material | Samarium Cobalt (SmCo) |
| Magnet max. temperature | 350°C |
| Internal pneumatic shutter | yes |
| Shutter type | dome type or flat swing |
| Insitu tilt module | yes, range +45° ÷ -10° |
| Chimney | yes |
| Dedicated materials: | |
| typical rates [nm/min] for 200 W: | |
| ?? Cu | 18,72 nm/min (distance: 170 mm; target thickness: 3 mm)*** |
| ?? Ti | 4,10 nm/min (distance: 170 mm; target thickness: 3 mm)*** |
| ?? Fe | 5,16 nm/min ( distance: 170 mm; target thickness: 3 mm)*** |
| Internal gas inlet | yes (VCR standard) |
| Working gas | Ar |
| Max. working pressure | 5×10-3?– 1×10-1?mbar |
| Optimal working pressure | 5×10-3?– 5×10-2?mbar |
C型磁控濺射源既兼容射頻，也兼容直流，可以沉積多種材料：導體、半導體和絕緣體。磁控管源能夠產生均勻、均質和小晶粒的薄膜；具有高密度（低空隙面積）、高鏡面性（反射率）、無輻射損傷和粘合斷裂等優點。
| Mounting flange | DN 160 CF* |
| Max. power (DC mode) | 600 W DC ** |
| Max. power (RF mode) | 600 W RF ** |
| Max. voltage DC | 1200 V |
| Connector DC/RF | type 7/16 |
| Target | Keeper standard |
| ?? form | circular |
| ?? diameter | 3″ (76.2 mm) ± 0.2 mm |
| ?? thickness | 1 – 6 mm |
| ?? cooling | indirect |
| Water flow | min. 1 l/min |
| Max. inlet water temperature | < 28 °C |
| Max. water pressure | 3 bar |
| Tubing diameter | ?6×1 mm PTFE |
| Magnet material | Neodymium Iron Boride (NdFeB) |
| Magnet max. temperature | 200 °C |
| Internal pneumatic shutter | yes |
| Shutter type | dome type or flat swing |
| Insitu tilt module | yes, range +45° ÷ -10° |
| Chimney | yes |
| Dedicated materials: | |
| typical rates [nm/min] for 200 W: | |
| ?? Cu | 19,76 nm/min (distance: 150 mm; target thickness: 3 mm)*** |
| ?? Ti | 4,08 nm/min (distance: 150 mm; target thickness: 6 mm)*** 4,32 nm/min (distance: 150 mm; target thickness: 3 mm)*** |
| Internal gas inlet | yes (VCR standard) |
| Working gas | Ar |
| Max. working pressure | 5×10-3?– 1×10-1?mbar |
| Optimal working pressure | 5×10-3?– 5×10-2?mbar |
* Other mounting flanges on request
** The maximum power is determined by the target material
*** Distances depend on the geometry of the chamber and the magnetrons
